Double chamber ion source

Details Double chamber ion source Double chamber ion source

H - Electricity

01

J

358/25

H01J 33/00 (2006.01) H01J 27/14 (2006.01) H01J 37/08 (2006.01)

Patent

CA 1039860

DOUBLE CHAMBER ION SOURCE ABSTRACT OF THE DISCLOSURE The ion source is comprised of two discharge chambers one of which is provided with a filament and an aperture leading into the other chamber which in turn has an extraction orifice. A low voltage arc dis- charge is operated in an inert gas atmosphere in the filament chamber while an arc of higher voltage is operated in the second ionization chamber which contains a vapor which will give the desired dopant ion species. The entire source is immersed in an axial magnetic field parallel to a line connecting the filament, the aperture between the two chambers and the extraction orifice.

238428

Affiliated with

Also associated with

Rating

Double chamber ion source does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Double chamber ion source, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Double chamber ion source will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-942287