Double focusing microscope for registering semiconductor...

Details Double focusing microscope for registering semiconductor... Double focusing microscope for registering semiconductor...

G - Physics

01

B

356/198, 88/20,

G01B 11/27 (2006.01) G02B 3/10 (2006.01) G02B 5/30 (2006.01) G02B 27/28 (2006.01) G02B 27/40 (2006.01) G03F 9/00 (2006.01)

Patent

CA 1046823

METHOD AND APPARATUS FOR ALIGNING MASK AND WAFER Abstract of the Disclosure In a semiconductor photolithographic mask alignment system, a unique bifocus element is included in the microscope for permitting simultaneous focusing on the mask and semiconductor wafer surface, even though the mask and wafer separation is greater than the microscope depth of field. The bifocus element is preferably located at the rear focal plane of the microscope objective and is designed to image, at the same location, light from the mask polarized in a first direction and light from the wafer polarized at right angles to the first direction.

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