C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
C11D 7/00 (2006.01) C11D 3/38 (2006.01) C11D 17/00 (2006.01) C12N 1/20 (2006.01)
Patent
CA 2093970
Abstract of the Disclosure: A liquid drain opener formulation which comprises a stable suspension of viable microorganisms, a surfactant, and a preservative all contained in an aqueous medium and having a pH in the range of about 3 to 10.
Dent Douglas A.
Griffin William M.
Ritter Rhonda T.
Borden Ladner Gervais Llp
Sybron Chemical Holdings Inc.
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