Dry developer particle of resistivity higher than 10 su14 xx...

Details Dry developer particle of resistivity higher than 10 su14 xx... Dry developer particle of resistivity higher than 10 su14 xx...

G - Physics

03

G

96/229, 96/53

G03G 15/09 (2006.01) G03G 9/083 (2006.01)

Patent

CA 1084325

Abstract of the Disclosure A dry developer particle for use in electrophotography including thermoplastic synthetic resin and magnetic materials to have an electric resistance higher than 1014 .OMEGA.cm to possess mag- netically attractive and electrically insulating properties. There is further provided a method for developing an electrostatic charge image on a photosensitive element by such developer parti- cles under the action of electric and electrostatic forces gener- ated therebetween.

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