Dry-developing photosensitive dry film resist

Details Dry-developing photosensitive dry film resist Dry-developing photosensitive dry film resist

G - Physics

03

C

96/177, 96/21, 9

G03C 11/12 (2006.01) G03F 7/34 (2006.01) H05K 3/00 (2006.01)

Patent

CA 1154287

Title Dry-Developing Photosensitive Dry Film Resist Abstract A dry-developing dry film resist is provided comprising a photopolymerizable layer preferably sandwiched between a support sheet and a cover sheet, the layer com- prising polymerizable monomer in excess of the absorptive capacity of the layer, photopolymerization initiator, and binder component of a plurality of polymers, at least one of these polymers being incompatible so as to be present as a dispersion in the layer to reduce the cohesive strength of the layer. The layer is developed by peeling away the support sheet, the unexposed area of the layer adhering to the support sheet and the exposed area adhering to the substrate to which it was laminated to form a resist image against such treatments as etching, plating and soldering, especially to make a printed circuit. PD-1754

346214

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