Dry-strip antihalation layer for photothermographic film

Details Dry-strip antihalation layer for photothermographic film Dry-strip antihalation layer for photothermographic film

G - Physics

03

C

96/201

G03C 1/825 (2006.01) G03C 1/498 (2006.01)

Patent

CA 1209393

-1- Abstract of the Disclosure A photothermographic element having a strippably-adhered, antihalation layer is disclosed. The element comprises at least one photosensitive layer adhered to one surface of a support base, and an antihalation layer having a resistance greater than 5000 ohms per square, adhered to any surface of said element and dry-strippable therefrom, said antihalation layer having a delaminating resistance in the range of 6 to 50 g/cm, a layer strength in g/cm greater than its delaminating resistance, and an optical density of at least 0.1.

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