C - Chemistry – Metallurgy – 08 – G
Patent
C - Chemistry, Metallurgy
08
G
C08G 2/26 (2006.01) C08J 3/24 (2006.01) C08K 5/1515 (2006.01) C09D 163/00 (2006.01)
Patent
CA 2545998
Photopolymerizable liquid oligomeric compositions are disclosed. The oligomeric compositions are formed from cycloaliphatic epoxides and Michael addition polyacrylate resins, synthesized from multifunctional acrylates and .beta.-dicarbonyl Michael donors, specifically .beta.-keto esters, .beta.- diketones, .beta.-ketoamides or .beta.-ketoanilides or combinations thereof. The oligomeric compositions are provided along with uses thereof and methods of fabricating.
L'invention concerne des compositions oligomères liquides photopolymérisables. Ces compositions oligomères sont préparées à partir d'époxydes cycloaliphatiques et de résines de polyacrylate d'addition de Michael synthétisées à partir d'acrylates multifonctionnels et de donneurs de Michael .beta.-dicarbonyliques, et notamment de .beta.-cétoesters, de .beta.-dicétones, de .beta.-cétoamides ou de .beta.-cétoanilides ou de combinaisons correspondantes. Lesdites compositions oligomères sont décrites conjointement avec leurs utilisations et leurs procédés de préparation.
Dammann Laurence G.
Fechter Robert B.
Narayan-Sarathy Sridevi
Ashland Licensing And Intellectual Property Llc
Gowling Lafleur Henderson Llp
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