Dynamically adjustable high resolution adjustable slit

Details Dynamically adjustable high resolution adjustable slit Dynamically adjustable high resolution adjustable slit

H - Electricity

01

L

H01L 21/02 (2006.01) G03F 7/20 (2006.01)

Patent

CA 2294677

Blades (48) pivotally attached together linked to push rods (34) and inserted into an illumination field, energy or flux (510). The blades (48; 520) extend longitudinally along the length of a rectangular illumination field or slit (510) used to image a reticle (537) onto a photosensitive substrate. The blades (48; 520) controllably adjust the width of the rectangular illumination field (510) to modify the illumination intensity or energy provided to a photosensitive substrate. The illumination field (510) is scanned across the photosensitive substrate (560) to expose it with the image of a reticle (537). The blades (48; 520) are dynamically controlled (541) during the scanning exposure to adjust the illumination intensity or energy in a predetermined way. The resulting selective change in exposure dose corrects local area of line width variance. Various errors in pattern reproduction using a photolithographic system are relatively easily corrected. This is particularly advantageous in a scanning lithography system used in the manufacture of semiconductors.

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