Eb pattern profile printing

G - Physics – 03 – F

Patent

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Details

G03F 7/00 (2006.01) B41F 23/08 (2006.01) B41M 3/00 (2006.01) B41M 3/06 (2006.01) G03F 7/16 (2006.01) G03F 7/26 (2006.01)

Patent

CA 2411239

The present invention provides a printing process and a printed product in which a coating is combined with an additive that Iowers the surface tension of the dried coating. The coating pattern is printed on a substrate, and is cured using electron beam ("EB") processing. An ink is printed on top of the dried coating pattern. The ink flows away from the coating due to the difference in surface tension, forming a pattern of raised ink between the pattern and the coating.

L'invention concerne un procédé d'impression et un produit imprimé sur lequel un enduit est combiné à un additif qui réduit la tension superficielle de l'enduit une fois sec. Le motif de couchage est imprimé sur un substrat, puis est durci au moyen d'un couchage par faisceau d'électrons. Une encre est imprimée sur le dessus du motif de couchage sec. L'encre fuit l'enduit à cause de la différence de tension superficielle et forme un motif surélevé entre les lignes du motif de couchage.

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