C - Chemistry – Metallurgy – 07 – K
Patent
C - Chemistry, Metallurgy
07
K
C07K 7/56 (2006.01) A61K 38/12 (2006.01) A61P 31/10 (2006.01) A61K 38/00 (2006.01)
Patent
CA 2376025
The invention concerns in all possible isomeric forms as well as their mixtures, compounds of formula (I) wherein: either R¿1? represents H or CH¿3? and R¿2? represents cyclohexyl substituted by an amine, a (CH¿2?)b-C≡N radical; or R¿1? and R¿2? form with the nitrogen which bears them a cycle with 3, 4 or 5 carbons optionally substituted by an amine; R¿3? represents hydrogen, methyl of hydroxyl; R¿4? represents hydrogen or hydroxyl; R represents a linear, branched or cyclic chain; T represents hydrogen, methyl, CH¿2?CONH¿2?, CH¿2?C≡N, a (CH¿2?)¿2?NH¿2? or (CH¿2?)¿2?Nalk?+¿X?-¿ radical, X being halogen and alk an alkyl radical; Y represents hydrogen, hydroxyl, halogen or OSO¿3?H; W represents H or OH; Z represents H, CH¿3?. The compounds of formula (I) have antifungal properties.
L'invention a pour objet sous toutes les formes d'isomères possibles ainsi que leurs mélanges, les composés de formule (I) dans lesquels ou bien R1: H ou CH3 et R2 cyclohexyle substitué par une amine, un radical (CH2)b-C.ident.N ou bien R1 et R2 forment avec l'azote qui les porte un cycle à 3, 4 ou 5 carbones éventuellement substitué par une amine, R3 hydrogène, méthyle ou hydroxyle, R4 hydrogène ou hydroxyle, R représente une chaîne linéaire, ramifiée ou cyclique, T hydrogène, méthyle, CH2CONH2, CH2C.ident.N, un radical (CH2)2NH2 ou (CH2)2Nalc+X-, X halogène et alc alkyle, Y hydrogène, hydroxyle, halogène ou OSO3H, W H ou OH, Z H, CH3. Les composés de formule (I) présentent des propriétés antifongiques.
Fauveau Patrick
Hawser Stephen
Lebourg Gilles
Schio Laurent
Aventis Pharma S.a.
Novexel
Robic
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