Effective near neutral ph etching solution for molybdenum or...

Details Effective near neutral ph etching solution for molybdenum or... Effective near neutral ph etching solution for molybdenum or...

C - Chemistry, Metallurgy

23

F

149/20

C23F 1/14 (2006.01)

Patent

CA 2039029

A neutral or near neutral pH etching solution for effectively etching molybdenum and tungsten including: an aqueous ferricyanide ion solution, a soluble molybdate or tungstate, and an essential compound such that upon combination of said soluble molybdate or tungstate and said essential compound, a heteropoly compound is formed in which said essential compound contributes at least one heteroatom to said heteropoly compound. The etching solution is most preferably used for etching molybdenum or tungsten which is adhered or proximate to a base-sensitive material.

Affiliated with

Also associated with

Rating

Effective near neutral ph etching solution for molybdenum or... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Effective near neutral ph etching solution for molybdenum or..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Effective near neutral ph etching solution for molybdenum or... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1699021