Electric arc vapor deposition method and apparatus

Details Electric arc vapor deposition method and apparatus Electric arc vapor deposition method and apparatus

C - Chemistry, Metallurgy

23

C

204/96.04, 204/1

C23C 4/00 (2006.01) C23C 14/32 (2006.01) H01J 37/32 (2006.01)

Patent

CA 1306972

Abstract An improved method and apparatus for maintaining cathode spots in an electric arc vapor deposition coating process, on the desired cathode evaporation surface are disclosed. A primary anode is arranged, configured and biased within a vacuum deposition coating chamber relative to a cathodic source so as to maintain an electric arc therebetween. A relative biasing network maintains a voltage difference during deposition between the primary anode and other conduc- tive surfaces within the chamber, or the chamber wall itself, such that electrons leaving the cathode are preferentially drawn toward the primary anode rather than to other conductive surfaces. The anode orienta- tion within the chamber causes those electrons drawn toward it to tend to maintain the cathode spots on the desired cathode evaporation surface for maintaining arc stability at low arc current levels.

512044

Affiliated with

Also associated with

Rating

Electric arc vapor deposition method and apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electric arc vapor deposition method and apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electric arc vapor deposition method and apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1182809