G - Physics – 03 – F
Patent
G - Physics
03
F
96/150
G03F 7/038 (2006.01) G03F 7/027 (2006.01) G03F 7/032 (2006.01)
Patent
CA 2009167
Abstract of the Disclosure An electrically conductive resist material is disclosed, comprising at least one polymer which is sensitive to ionizing radiation and a soluble electrically conductive oligomer or polymer. A process for producing the resist material is also described, comprising admixing an electrically conductive oligomer or polymer dissolved in a solvent to at least one polymer which is sensitive to ionizing radiation. The resist material is useful in preparing electron beam resists which prevent electrostatic charging and resultant electrostatic fields.
Dammel Ralph
Feldhues Michael
Kaempf Guenther
Lingnau Juergen
Scheunemann Ude
Dammel Ralph
Feldhues Michael
Fetherstonhaugh & Co.
Hoechst Aktiengesellschaft
Kaempf Guenther
LandOfFree
Electrically conductive resist material, a process for its... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Electrically conductive resist material, a process for its..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrically conductive resist material, a process for its... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1897055