Electrically conductive resist material, a process for its...

G - Physics – 03 – F

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G03F 7/038 (2006.01) G03F 7/027 (2006.01) G03F 7/032 (2006.01)

Patent

CA 2009167

Abstract of the Disclosure An electrically conductive resist material is disclosed, comprising at least one polymer which is sensitive to ionizing radiation and a soluble electrically conductive oligomer or polymer. A process for producing the resist material is also described, comprising admixing an electrically conductive oligomer or polymer dissolved in a solvent to at least one polymer which is sensitive to ionizing radiation. The resist material is useful in preparing electron beam resists which prevent electrostatic charging and resultant electrostatic fields.

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