C - Chemistry – Metallurgy – 25 – D
Patent
C - Chemistry, Metallurgy
25
D
204/35
C25D 5/00 (2006.01) C25D 3/02 (2006.01) C25D 3/04 (2006.01) C25D 5/18 (2006.01)
Patent
CA 1076988
Abstract of the Disclosure In a process for the treatment of metal surfaces by the electro- deposition of metal coatings from aqueous solutions high current densities can be achieved by inhibiting hydrogen transport towards the cathode. This inhibiting is brought about by applying a base voltage between the electrodes which is larger than the precipitation voltage of the metal but smaller than the precipitation voltage of the hydrogen in the particular bath used. Periodic pulses several times greater than the base voltage are superimposed on the base voltage. During the pulse duration several atomic layers of metal are deposited and in the intervals between pulses hydrogen is diffused out of the deposit and escapes as gas. Inhibition can also be effected by using in the bath compounds with one or more complexed halogens which dissociate in aqueous solution while maintaining the bond in the complex.
241449
Heierli Werner
Laing Nikolaus
Schaper Peter
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