Electro-optic semiconductor devices and method for making...

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H01S 5/026 (2006.01) G02B 6/12 (2006.01) H01L 21/20 (2006.01) H01L 27/15 (2006.01) H01L 31/12 (2006.01) H01S 5/343 (2006.01)

Patent

CA 2338065

An electro-optic semiconductor device (2) comprising a semiconductor waveguide (14) with a core region (12) within which is located at least one active area (4) wherein the core (12) of the waveguide (14) outside of the one or more active areas (4) are not contaminated by diffuse active area material and the one or more active area(s) and the waveguide are monolithic and are grown in an additive growth process. Also provided is a method of making an electro- optic semiconductor device (2), comprising the steps of: growing a first part of a core layer (12) of a semiconductor waveguide (14), selectively growing an active layer (8, 10) over a partial area of the first part of the core layer, and growing a second part of the core layer of the semiconductor waveguide over the first part and the active layer, characterised in that the method comprises an additive growth process.

L'invention concerne un dispositif électro-optique semi-conducteur (2) qui comprend un guide d'ondes semi-conducteur (14) comportant une région noyau (12) à l'intérieur de laquelle se trouve au moins une zone active (4). Le noyau (12) du guide d'ondes (14) à l'extérieur d'une ou de plusieurs zones actives (4) n'est pas contaminé par le matériau diffus de la zone active, une ou plusieurs zones actives et le guide d'ondes formant une structure monolithique et ayant poussé selon un processus de croissance par addition. L'invention concerne aussi un procédé pour fabriquer le dispositif électro-optique semi-conducteur (2) qui consiste en ce qui suit: faire pousser une première partie d'une couche noyau (12) d'un guide d'ondes semi-conducteur (14); faire pousser sélectivement une couche active (8, 10) par-dessus une zone partielle de la première partie de la couche de noyau et; faire pousser une deuxième partie de la couche noyau du guide d'ondes semi-conducteur par-dessus la première partie et de la couche active, le procédé étant caractérisé en ce qu'il comprend un processus de croissance par addition.

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