H - Electricity – 01 – L
Patent
H - Electricity
01
L
356/172
H01L 29/40 (2006.01) H01L 21/285 (2006.01) H01L 23/532 (2006.01) H01L 29/45 (2006.01)
Patent
CA 1171977
- 20 - Abstract of the Disclosure A semiconductor layer is formed on at least one portion of a silicon substrate. The layer is made of poly-crystalline or amorphous multicomponent containing silicon, at least one element of Group IV having an ato- mic radius larger than that of silicon, such as ger- manium or tin, and doner impurity or acceptor impurity.
386975
Mizushima Yoshihiko
Murase Katsumi
Nippon Telegraph & Telephone Public Corporation
Ridout & Maybee Llp
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