C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
C23C 4/12 (2006.01)
Patent
CA 2712119
A coating deposition apparatus has first and second charge sources. The first charge source is chargeable to a first voltage potential and the second charge source is chargeable to a second voltage potential. The coating deposition apparatus also has a first output terminal and a deposition substance connected thereto, and a second output terminal for connection to a workpiece. The consumable deposition substance is movable relative to the workpiece. The first charge source is connected between the first and second terminals whereby the first voltage potential is established therebetween. The second charge source is connected between the terminals. The coating deposition apparatus also has discharge control circuitry connected to the first and second charge sources to inhibit discharge of the second charge source through the terminals prior to commencement of discharge of the first charge source through the terminals.
Chan Kevin R.
Leung Cheuk H.
Scotchmer Nigel
Bereskin & Parr Llp/s.e.n.c.r.l.,s.r.l.
Huys Industries Limited
LandOfFree
Electrode coating apparatus and method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Electrode coating apparatus and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrode coating apparatus and method will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1594044