C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
C23C 26/00 (2006.01)
Patent
CA 2494366
To form a thick film through a coating conducted by a submerged pulse- discharge treatment, not less than 40 volume % of a metal material, which never or hardly forms a carbide, is contained in an electrode as an electrode material.
L'invention concerne la formation d'un film épais par le biais d'un revêtement produit par traitement de décharge d'impulsion immergée, non inférieur à 40 volume % d'un matériau métallique, ne formant jamais ou presque jamais un carbure, contenu dans une électrode en tant que matériau d'électrode.
Akiyoshi Masao
Goto Akihiro
Ochiai Hiroyuki
Watanabe Mitsutoshi
Fetherstonhaugh & Co.
Ishikawajima-Harima Heavy Industries Co. Ltd.
Mitsubishi Denki Kabushiki Kaisha
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