Electrode structure for a semiconductor device

H - Electricity – 01 – L

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

356/172

H01L 29/08 (2006.01) H01L 23/482 (2006.01) H01L 29/45 (2006.01) H01L 29/47 (2006.01) H01L 29/861 (2006.01) H01L 29/868 (2006.01)

Patent

CA 1150417

Abstract of the Disclosure An electrode structure for use in semiconductor devices comprising: a semiconductive layer; a conductive layer disposed on one surface of the semiconductive layer; first regions which intervene between the layers and serve as passages for transmitting minority carriers from the semi- conductive layer to the conductive layer; and second regions which intervene between the layers and serve as passages for conveying majority carriers between the semiconductive layer and conductive layer, the first and second regions being selectively formed on the semiconductive layer so as to be adjacent to one another.

347000

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Electrode structure for a semiconductor device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electrode structure for a semiconductor device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrode structure for a semiconductor device will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-41285

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.