C - Chemistry – Metallurgy – 25 – D
Patent
C - Chemistry, Metallurgy
25
D
C25D 13/06 (2006.01) C09D 5/44 (2006.01)
Patent
CA 2095575
92/K 034 - ? - Abstract of the Disclosure: Electrodeposition bath comprising a urethane An electrodeposition bath comprising a urethane of the formula R1-NHCOO-Rz in which R1 is alkyl or a group of the formula B1-NH-B2-[X-B3]n-, R2 is a group of the formulae -(C2H4O)y-R1, -(C3H7O)y-R or of the formula Image , R is C1-C18-alkyl, Y is a number from zero to 4, B1 is hydrogen, alkyl or a group of the formula -COOR2, B2 and B3 may be identical or different and are C2-C14 alkylene, n is an integer from 0 to 5, X is -O-, -S-, -NH- or >N-(C1-C4)alkyl, R3 is hydrogen, alkyl, alkenyl, hydroxyalkyl, phenyl or alkylphenyl, R4 and R5 may be identical or different and are hydrogen or C1-C4-alkyl and A is a direct bond or one of the groups -O-, -CH2O- or -CH2OCO-. - ? - The inclusion of these urethanes in the electrodeposition bath brings about a reduction in the number of surface defects on galvanized surfaces.
Hoenel Michael
Klima Heinz
Walz Gerd
Wehner Susanne
Ziegler Peter
Fetherstonhaugh & Co.
Hoechst Aktiengesellschaft
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