Electrodeposition of chromium and its alloys

Details Electrodeposition of chromium and its alloys Electrodeposition of chromium and its alloys

C - Chemistry, Metallurgy

25

D

204/35

C25D 3/06 (2006.01) C25D 3/56 (2006.01)

Patent

CA 1209088

ELECTRODEPOSITION OF CHROMIUM AND ITS ALLOYS Abstract A chromium electroplating electrolyte containing trivalent chromium ions a complexant, a buffer agent and organic compound having a -C=S group or a -C-S group within the molecule for promoting chromium deposition. The complexant is preferably selected so that the stability constant K1 of the chromium complex is in the range 108 < K1 < 1012 M-1. Complexants within this range include aspartic acid, iminodiacetic acid, nitrilotriacetic acid or 5-sulphosalicylic acid. Suitable organic compounds having a -C = S group include thiourea, N-monoallyl thiourea, N-mono-p-tolyl thiourea, thioacetamide, tetramethyl thiuram monosulphide, tetraethyl thiuram disulphide and diethyldithiocarbonate. Suitable organic compounds having a -C-S group include mercaptoacetic and or mercaptopropionic acid.

415396

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