Electrodeposition of ruthenium

C - Chemistry – Metallurgy – 25 – D

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

204/25

C25D 5/10 (2006.01) C25D 5/18 (2006.01) H01H 1/02 (2006.01)

Patent

CA 1116120

H-1940 EN-1949 TITLE ELECTRODEPOSITION OF RUTHENIUM ABSTRACT OF THE DISCLOSURE A method for the electrodeposition of a relatively thick (20 to 45 microinches) layer of ruthenium includes the step of pulse current plating an intermediate layer of gold over the substrate to be plated. The ruthenium layer so obtained is characterized by low internal stress and an absence of surface cracks.

295637

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Electrodeposition of ruthenium does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electrodeposition of ruthenium, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrodeposition of ruthenium will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-265429

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.