C - Chemistry – Metallurgy – 25 – D
Patent
C - Chemistry, Metallurgy
25
D
204/25
C25D 5/10 (2006.01) C25D 5/18 (2006.01) H01H 1/02 (2006.01)
Patent
CA 1116120
H-1940 EN-1949 TITLE ELECTRODEPOSITION OF RUTHENIUM ABSTRACT OF THE DISCLOSURE A method for the electrodeposition of a relatively thick (20 to 45 microinches) layer of ruthenium includes the step of pulse current plating an intermediate layer of gold over the substrate to be plated. The ruthenium layer so obtained is characterized by low internal stress and an absence of surface cracks.
295637
Gte Automatic Electric Laboratories Incorporated
R. William Wray & Associates
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