Electrodeposition of sulfur-bearing nickel

C - Chemistry – Metallurgy – 25 – C

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C25C 1/08 (2006.01) C25D 3/12 (2006.01)

Patent

CA 1149768

ABSTRACT When the electrodeposition of nickel is carried out in the presence of sulphur, it is desirable to control the content and the distribution of the sulphur in the deposited nickel. Sulphur-bearing nickel is deposited onto a multiplicity of cathodes in an electrolytic cell. The electrolyte contains nickel and chloride as principal ions and at least one thiocyanate compound. The oxidation of the thiocyanate ions within the cell by the chlorine gas generated at the anodes, is almost completely avoided by directing the flow of the electrolyte from the cathode compartment through diaphragms into the anode compartments. The unidirectional flow of the electrolyte is ensured by continuous removal of chlorine and chlorine containing electrolyte by suction from the anode compartments, through a manifold. Back diffusion of chlorine to the cathode is further prevented by means of a weir outside the diaphragm enclosed anode compartments.

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