Electrodeposition process for forming amorphous silicon

Details Electrodeposition process for forming amorphous silicon Electrodeposition process for forming amorphous silicon

C - Chemistry, Metallurgy

30

B

204/24.25, 148/3

C30B 29/06 (2006.01) C25D 5/50 (2006.01) C25D 9/08 (2006.01) C25D 11/32 (2006.01) H01L 31/20 (2006.01)

Patent

CA 1135162

(U.S. 951,580) ABSTRACT OF THE DISCLOSURE A method for electroplating amorphous silicon from a non-aqueous solution containing a silicon solute wherein a heat treatment is requisite to producing stable coatings of photoconductive amorphous silicon.

336434

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