C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
6/4, 117/80
C23C 18/40 (2006.01)
Patent
CA 947458
Geertsema Eise B.
Jonker Hendrik
Molenaar Arian
LandOfFree
Electroless deposition of ductile copper does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Electroless deposition of ductile copper, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electroless deposition of ductile copper will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1099155