C - Chemistry – Metallurgy – 09 – D
Patent
C - Chemistry, Metallurgy
09
D
400/7921
C09D 11/00 (2006.01) C08L 63/00 (2006.01) C08L 63/02 (2006.01) C08L 63/04 (2006.01) G03F 7/028 (2006.01) H05K 3/18 (2006.01) H05K 3/00 (2006.01)
Patent
CA 2027424
ELECTROLESS PLATING-RESISTING INK COMPOSITION ABSTRACT A photocurable ink composition for forming patterns resistive to electroless plating is disclosed which includes (a) an epoxy resin, (b) an aliphatic polyol polyglycidyl ether as a reactive, viscosity controlling agent, (c) a photopolymerization catalyst, and (d) hydrophobic silica particles as a thixotropic agent.
Ogitani Osamu
Shirose Toru
Sim & Mcburney
Somar Corporation
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