C - Chemistry – Metallurgy – 25 – F
Patent
C - Chemistry, Metallurgy
25
F
204/80
C25F 1/00 (2006.01) A01N 59/08 (2006.01) A61L 2/02 (2006.01) A61L 2/03 (2006.01) A61L 2/18 (2006.01) A61L 12/02 (2006.01) A61L 12/12 (2006.01) C11D 7/18 (2006.01) C11D 7/60 (2006.01)
Patent
CA 2035764
Abstract of the Invention A novel aqueous solution for use in electrochemical cleaning and disinfecting is disclosed. The aqueous solution comprises hydrogen peroxide, a blend of a first ionizable salt and second ionizable salt, and a buffer, with the first ionizable salt being sodium chloride and the second ionizable salt including a metal of Group IA or IIA of the Periodic Table. Preferably a surfactant is included which is a non-ionic surfactant. Also, the preferred buffer is a phosphate buffer system. The preferred second ionizable salt is disclosed as being sodium sulfate. 76/1346e/1-34
Eisner Joseph Z.
Hietala Gerald W.
Oksman Henry C.
Sibley Murray J.
Abbott Laboratories
Goudreau Gage Dubuc
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