Electrolytically etching masked gold layer without exceeding...

Details Electrolytically etching masked gold layer without exceeding... Electrolytically etching masked gold layer without exceeding...

C - Chemistry, Metallurgy

25

F

204/86.5

C25F 3/02 (2006.01) C25F 3/14 (2006.01) H01L 21/28 (2006.01) H01L 21/768 (2006.01) H01L 29/41 (2006.01)

Patent

CA 1094502

PHN 8520 ABSTRACT: The invention relates to a method of manufacturing a body having a gold pattern in which an etchant resistant and electrically insulating masking layer is provided locally on the surface of a gold layer present on the body and parts of the surface of the gold layer not covered by the masking layer are subjected to a treatment in an etching bath by means of which the gold pattern is formed. According to the invention, the gold layer during the etching treatment is given a potential with respect to an electrode in the etching bath.

285709

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