C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
96/151, 402/298,
C07C 69/54 (2006.01) C07C 205/42 (2006.01) C08F 20/12 (2006.01)
Patent
CA 1090368
ABSTRACT OF THE DISCLOSURE Process for preparation of monomers of the formula Image wherein R is hydrogen or methyl; X and Y are independently selected from the group consisting of NO2, halogen, -CN and -CF3; and m and n can range from 0 to 3. Typical monomers embraced by the above formula can be prepared by Lewis Acid catalyzed esterification of methacrylic acid with a diazo derivative of an electron acceptor such as 9-diazo- 2,4,7-trinitrofluorenone. These monomers can be used with other binders or polymerized by standard, free-radical techni- ques to polymers capable of forming self-supporting films which are useful in electrophotographic imaging members and methods. -2-
253805
Sim & Mcburney
Xerox Corporation
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