Electron-beam and x-ray sensitive polymers and resists

Details Electron-beam and x-ray sensitive polymers and resists Electron-beam and x-ray sensitive polymers and resists

C - Chemistry, Metallurgy

08

F

96/179, 402/246

C08F 24/00 (2006.01) C08F 220/40 (2006.01) G03F 7/038 (2006.01)

Patent

CA 1225789

-0- ELECTRON-BEAM AND X-RAY SENSITIVE POLYMERS AND RESISTS Abstract There are disclosed polymers, E-beam sensitive elements and resists obtained therefrom, that are more sensitive than 5 X 10-7 coulombs per cm2 when exposed to a 15 keV electron beam. The polymers are copolymers of either allyl or propargyl methacrylate and of an acrylate or methacrylate bearing an oxygen- containing heterocyclic ring.

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