Electron beam apparatus and image forming apparatus

H - Electricity – 01 – J

Patent

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Details

H01J 31/10 (2006.01) H01J 29/02 (2006.01) H01J 29/08 (2006.01) H01J 29/10 (2006.01) H01J 29/12 (2006.01) H01J 29/20 (2006.01) H01J 29/30 (2006.01) H01J 31/12 (2006.01)

Patent

CA 2152740

An electron beam apparatus comprises an electron source having an electron-emitting device, an electrode for controlling an electron beam emitted from the electron source, a target to be irradiated with an electron beam emitted from the electron source and a spacer arranged between the electron source and the electrode. The spacer has a semiconductor film on the surface thereof that is electrically connected to said electron source and said electrode.

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