Electron-beam device and semiconductor device for use in...

Details Electron-beam device and semiconductor device for use in... Electron-beam device and semiconductor device for use in...

H - Electricity

01

J

313/35.35

H01J 29/48 (2006.01) H01J 3/02 (2006.01)

Patent

CA 1249012

19 ABSTRACT: A device for recording or displaying images or for electron lithographic or electron microscopic uses, comprising in an evacuated envelope (1) a target (7) on which at least one electron beam (6) is focussed. This beam is generated by means of a semiconductor device (10) which comprises an electrically insulating layer (42) having an aperture (38) through which passes the beam. The layer carries at least four beam-forming electrodes (43 up to and including 50) which are situated at regular intervals around the aperture (38), each of which elec- trodes has such a potential that an n-pole field or a combination of n-pole fields is generated in which n is an even integer greater than or equal to 4 and smaller than or equal to 16. A suitable choice of the n-pole field will make it possible to impart substantially any desired shape to the beam (6) and thus the focus on the target.

495932

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