Electron beam direct drawing device

Details Electron beam direct drawing device Electron beam direct drawing device

H - Electricity

05

K

356/22

H05K 3/06 (2006.01) G03F 7/20 (2006.01) H01J 37/302 (2006.01) H05K 3/00 (2006.01)

Patent

CA 1279732

ABSTRACT OF THE DISCLOSURE An electron beam direct drawing device for use in manufaturing a printed circuit board having a photoresist thereon according to a drawing pattern information obtained by a computer aided printed circuit board pattern design, comprises means for dividing the drawing pattern information over a whole area of the printed circuit board into a plural- ity of fields each capable of being scanned by electron beam and for re-editing drawing patterns of the rspective fields, means for storing the divided and then re-edited drawing pattern information, means for generating a first control signal for reading out the stored drawing pattern information sequentially and performing a main deflection of electron beam by means of a main deflector and means for generating a second control signal for deriving, from the stored drawing pattern information, information assigning an orientation of a pattern to be drawn and a scan width of a sub-deflection and for performing a predetermined sub-deflection scanning by means of a sub-deflector, whereby electron beam scans the printed circuit board under a control of a combination of the main deflection and the sub-deflection. A clock gene- rator capable of producing a plurality of clock signals each corresponding to a specific line width of the pattern is provided to expose the line with electron beam of optimum dose.

573522

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