Electron beam evaporation of transparent indium tin oxide

Details Electron beam evaporation of transparent indium tin oxide Electron beam evaporation of transparent indium tin oxide

C - Chemistry, Metallurgy

23

C

C23C 14/30 (2006.01) C23C 14/08 (2006.01) C23C 14/54 (2006.01)

Patent

CA 2372300

A process for depositing a transparent coating of indium tin oxide on a substrate comprising providing said substrate in a partial vacuum environment and conducting electron beam evaporation of tin oxide doped indium oxide granules while operating an ion source providing oxygen adjacent said substrate until a coating of indium tin oxide is deposited on at least a portion of said substrate.

L'invention concerne un procédé permettant de déposer un revêtement transparent d'oxyde d'indium-étain sur un substrat et consistant à disposer ledit substrat dans un environnement sous vide partiel et à effectuer une évaporation par faisceau électronique de granules d'oxyde d'indium dopés avec de l'oxyde d'étain tout en faisant fonctionner une source d'ions fournissant de l'oxygène adjacente au substrat, jusqu'à ce qu'un revêtement d'oxyde d'indium-étain se dépose sur au moins une partie dudit substrat.

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