Electron-beam exposure apparatus

Details Electron-beam exposure apparatus Electron-beam exposure apparatus

H - Electricity

01

L

356/192

H01L 21/30 (2006.01) H01J 37/302 (2006.01) H01J 37/317 (2006.01)

Patent

CA 1284237

ABSTRACT OF THE DISCLOSURE An electron-beam exposure apparatus having a correction function for correcting deflection distortion. The correction function is carried out by the provision of a correcting device including an analog correction unit 35 and a digital correction unit having a memory unit 10 for storing correction data other than data that can be expressed by a cubic function. The capacity of such a memory unit can be made smaller than that of conventional apparatuses.

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