Electron beam exposure system and an apparatus for carrying...

H - Electricity – 01 – L

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356/192, 352/82

H01L 21/70 (2006.01) H01J 37/302 (2006.01)

Patent

CA 1125441

ELECTRON BEAM LITHOGRAPHIC SYSTEM AND AN APPARATUS FOR CARRYING OUT THE SAME ABSTRACT OF THE DISCLOSURE Electron beam exposure system provides a basic pattern data memory for storing data corresponding to the dimensions and the positions of patterns of a basic unit pattern which frequently appears as a unit in a patterns to be exposed on a wafer, and a central processing unit provided with an additional memory system which stores data corresponding to the position at which the basic unit pattern is to be exposed. This system determines the position of the basic unit pattern by adding data from the basic pattern data memory and data from the additional memory system through the central processing unit in accord- ance with a command of the central processing unit. There- after, data corresponding to the dimensions of the patterns in the basic unit patterns from the basic pattern data memory are sent as an input to a deflection system. As a result, the system according to the present invention applies electron beam deflection signals, which are produced by using the obtained data corresponding to the positions and the dimensions of the basic unit patterns, to the deflecting means of the electron beam exposure apparatus.

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