Electron beam exposure system method and apparatus

Details Electron beam exposure system method and apparatus Electron beam exposure system method and apparatus

G - Physics

05

B

356/192, 342/6.3

G05B 19/12 (2006.01) H01J 37/304 (2006.01)

Patent

CA 1094668

Abstract of the Disclosure An electron beam exposure system and method for use in the process of fabricating microminiature devices at high speeds. The high-speed operation is achieved with a computer providing programmed commands specifying a particular pattern to be scanned. A processor, responsive to programmed data, generates scan data a line at a time and loads a line generator. The line generator steps to each exposure location in a line to provide control signals for controlling the position of the electron beam. The starting and end positions of scan lines in both the X and Y directions may be arbitrarily selected thereby eliminating the need for scanning areas not intended to be processed.

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