Electron beam sensitive mixture resist

Details Electron beam sensitive mixture resist Electron beam sensitive mixture resist

G - Physics

03

C

96/172

G03C 5/16 (2006.01) G03F 7/038 (2006.01)

Patent

CA 1211309

- 1 - ELECTRON BEAM SENSITIVE MIXTURE RESIST Abstract This invention describes an ionizing radiation sensitive material having high contrast, high sensitivity and comprised of the mixture of the half-ester or half amide product of reaction of an N-hydroxy or N-aminoalkyl amide with an alkylvinyl ether-maleic anhydride copolymer and the products of reaction of a hydroxy alkyl terminally unsaturated compound with an alkyl- vinyl ether-maleic anhydride copolymer. A typical material is made by mixing the product of reaction of hydroxyethyl pyrrolidone and octadecyl- vinyl ether-maleic anhydride copolymer with the products of reaction of the mixture of hydroxyethyl acrylate with octadecylvinyl ether-maleic anhydride copolymer.

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