Electron beam sensitive resist

Details Electron beam sensitive resist Electron beam sensitive resist

C - Chemistry, Metallurgy

08

G

42/2, 402/297, 4

C08G 69/44 (2006.01) G03F 7/038 (2006.01)

Patent

CA 1221194

- 1 - ELECTRON BEAM SENSITIVE RESIST Abstract This invention describes an ionizing radiation sensitive material having high contrast, high sensitivity and comprised of a mixed half-ester or half amide of the reaction of an N-hydroxy or N-aminoalkyl amide and a hydroxy alkyl terminally unsaturated compound with an alkylvinyl ether-maleic anhydride copolymer. A typical material is made by reacting hydroxyethyl pyrrolidone and hydroxyethyl acrylate with octadecylvinyl ether-maleic anhydride copolymer.

419022

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