Electron beam sensitive resist

Details Electron beam sensitive resist Electron beam sensitive resist

G - Physics

03

F

31/154

G03F 7/038 (2006.01) C08F 8/44 (2006.01)

Patent

CA 1218232

FDN-1395 ELECTRON BEAM SENSITIVE RESIST Abstract This invention describes an improved ionizing radiation sensitive material having high contrast, high sensitivity and comprised of a metal complex of a mixed half-ester or half amide product of the reaction of an N-hydroxy or N-aminoalkyl amide and a hydroxy alkyl terminally unsaturated compound with an alkylvinyl ether-maleic anhydride copolymer. A typical material is made by reacting a metal salt with the mixed half-ester or half- amide product of the reaction of an N-hydroxy or N-amino alkyl amide and a hydroxy alkyl terminally unsaturated compound with an alkyl vinyl ether- maleic anhydride copolymer.

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