H - Electricity – 01 – J
Patent
H - Electricity
01
J
313/28
H01J 27/18 (2006.01)
Patent
CA 1321229
ABSTRACT OF THE DISCLOSURE An electron cyclotron resonance ion source for an ion implanter. The source includes an ionization chamber surrounded along its length by an electromagnet. A number of extraction electrodes at an output end of the ionization chamber allow positively charged oxygen ions to pass through apertures in the electrodes. The uniformity of the axially aligned magnetic field in the ionization chamber is extended through the extraction electrode by a magnetically permeable electrode and through use of non- magnetically permeable material to mount others of said electrodes.
601416
Dionne Gerry
Hipple James G.
Shimada Masaru
Torii Yasuhiro
Watanabe Iwao
Borden Ladner Gervais Llp
Corporation Eaton
Nippon Telegraph & Telephone Corporation
LandOfFree
Electron cyclotron resonance ion source does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Electron cyclotron resonance ion source, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electron cyclotron resonance ion source will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1199290