Electron cyclotron resonance ion source

Details Electron cyclotron resonance ion source Electron cyclotron resonance ion source

H - Electricity

01

J

358/25, 313/28

H01J 27/18 (2006.01)

Patent

CA 1232375

ABSTRACT OF THE DISCLOSURE An electron cyclotron resonance ion source in which a plasma is confined in a magnetic configuration having a first group of coils located in the plane define by the tight window of an ultra-high frequency injector and surrounding the latter, supplying the magnetic field creating and confining a plasma as well as a second group of coils supplied in counter-field compared with the first group and surrounding an ion extraction system. Ion extraction takes place in a magnetic field well below that corresponding to the cyclotron resonance. This ion source has numerous applications in the field of thin layer sputtering, microetching, ion implantation, accelerators, etc. (Fig 2a).

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