Electron radiation dose tailoring by variable beam pulse...

Details Electron radiation dose tailoring by variable beam pulse... Electron radiation dose tailoring by variable beam pulse...

H - Electricity

05

H

H05H 9/00 (2006.01) H01J 33/02 (2006.01) H01J 37/304 (2006.01) H05H 1/00 (2006.01)

Patent

CA 2170982

A method and apparatus for controlling the delivered dose across a target area from an electron beam produced by a high energy, high power pulsed rf linear accelerator. Pulse width modulation as a function of scan position is applied to the rf drive pulses of the accelerator operated in a long pulse mode and fast feedback control is used to maintain uniform rf field intensity on an intra-pulse basis. In an alternative embodiment, rf drive pulses are inhibited as a function of scan position.

Un procédé et un appareil permettent de maîtriser une dose délivrée sur une zone cible par un faisceau électronique produit par un accélérateur linéaire rf pulsé à haute énergie et haute puissance. On applique une modulation de largeur d'impulsion en fonction d'une position de scannage aux impulsions d'attaque rf de l'accélérateur exploité en mode d'impulsions longues, et on utilise une commande à rétroaction rapide pour maintenir une intensité de champ rf uniforme dans chaque pulsation. Dans une variante, les impulsions d'attaque fr sont bloquées en fonction d'une position de scannage.

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