C - Chemistry – Metallurgy – 25 – D
Patent
C - Chemistry, Metallurgy
25
D
C25D 5/02 (2006.01) C25D 17/00 (2006.01) H05K 3/42 (2006.01) H05K 3/00 (2006.01)
Patent
CA 2079033
ABSTRACT OF THE DISCLOSURE An electroplating apparatus having a plurality of upper electrolyte feeder elements and upper electrolyte discharge elements aligned transversely relative to a throughput path of the printed circuit boards and arranged in alternation above the throughput path, a plurality of lower electrolyte feeder elements and lower electrolyte discharge elements aligned transversely relative to the throughput path and arranged in alternation under the throughput path, wherein each lower electrolyte discharge element is positioned opposite an upper electrolyte feeder element and each upper electrolyte discharge elements is positioned opposite a lower electrolyte feeder element, and wherein vertical and horizontal flow components of the electrolyte solution result and their direction alternatingly changes as seen along the throughput path of the printed circuit boards.
Hosten Daniel
Van Puymbroeck Josef
Aktiengesellschaft Siemens
Fetherstonhaugh & Co.
Hosten Daniel
Van Puymbroeck Josef
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