Electrostatic chuck

H - Electricity – 01 – L

Patent

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Details

H01L 21/00 (2006.01) H01L 21/683 (2006.01) H02N 13/00 (2006.01) H05F 3/00 (2006.01)

Patent

CA 2254051

An electrostatic wafer-holding chuck (10) includes first (14) and second (20) dielectric plates formed of single crystal aluminum oxide and at least one electrode (16) disposed within a recess (14A) formed within the first dielectric plate (14). The second dielectric plate (20) has a top wafer supporting surface (20A) that has a fluid distribution network (28) formed therein. The fluid distribution network (28) channels a heat transfer medium (22) to the backside of the wafer (W). When the first (14) and second (20) dielectric plates are assembled, the first dielectric plate (14) is disposed contiguous to the second dielectric plate (20) and then are diffusively joined together to form a monolithic, hermetically sealed electrostatic chuck (10).

L'invention concerne un mandrin électrostatique (10) retenant une tranche et comprenant des première (14) et seconde (20) plaques diélectriques formées dans un oxyde d'aluminium monocristallin et au moins une électrode (16) placée dans un évidement (14A) formé à l'intérieur de la première plaque diélectrique (14). La seconde plaque diélectrique (20) comporte une surface supérieure (20A) supportant la tranche et sur laquelle est formé un réseau de distribution de fluide (28). Ce réseau de distribution de fluide (28) dirige un milieu de transfert de chaleur (22) vers la face arrière de la tranche (W). Lorsque les première (14) et seconde (20) plaques diélectriques sont assemblées, la première plaque (14) se trouve contiguë à la seconde (20), et celles-ci sont ensuite réunies par diffusion de chaleur afin de former un mandrin électrostatique hermétique, monolithe (10).

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