G - Physics – 01 – N
Patent
G - Physics
01
N
G01N 21/71 (2006.01)
Patent
CA 2359010
The invention concerns an elementary analysis device by optical emission spectrometry on plasma produced by laser, comprising a pulsed laser source (6), means (8, 10, 12) focusing the light from said source onto an object to be analysed (2), to produce plasma on the surface of the object, means (16, 18) for analysing a spectrum of the plasma radiation, means (20) for determining, from said analysis, the elementary composition of the object, and optional means (4) for moving the object. The invention is useful in particular for controlling radioactive materials.
Image Dispositif d'analyse elémentaire par spectrométrie d'émission optique sur plasma produit par laser. Ce dispositif comprend une source laser pulsée (6), des moyens (8, 10, 12) de focalisation de la lumière de cette source sur un objet à analyser (2), pour produire un plasma sur la surface de l'objet, des moyens (16, 18) d'analyse d'un spectre du rayonnement du plasma, des moyens (20) de détermination, à partir de cette analyse, de la composition élémentaire de l'objet, et d'éventuels moyens (4) de déplacement de l'objet. L'invention s'applique notamment au contrôle de matériaux radioactifs.
Detalle Vincent
Lacour Jean-Luc
Mauchien Patrick
Wagner Jean-Francois
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