Ellipsometric control of material growth

Details Ellipsometric control of material growth Ellipsometric control of material growth

H - Electricity

01

L

356/178, 356/187

H01L 21/46 (2006.01) C23C 14/54 (2006.01) C23C 16/52 (2006.01) C30B 23/00 (2006.01) C30B 25/16 (2006.01)

Patent

CA 2034650

Abstract of the Disclosure A method and apparatus for controlling the growth of a multi- species film. During the film growth, an ellipsometer(40,52,54,62,64,70,72) continuously monitors the surface(24) on which the film is growing. The ellipsometer data is used to calculate(38) the effective complex dielectric constant of the thin- film/substrate structure. A sequence of such data is used in a model calculation to determine the composition of the top portion of the thin film. The measured composition is compared with the target composition and the amount supplied of one of the species is correspondingly changed(26).

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