C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
182/2.1, 260/557
C07C 231/20 (2006.01) B01D 15/08 (2006.01) B01J 20/289 (2006.01) B01J 20/29 (2006.01) B01J 20/32 (2006.01) C07F 7/10 (2006.01) C07F 7/18 (2006.01)
Patent
CA 2005855
Abstract of the Disclosure A compound of formula I Image (I), wherein R1 is C1-C4alkyl, phenyl or benzyl, R2 is C1-C4alkyl, phenyl or benzyl, a is 0,1 or 2, R3 is linear or branched unsubstituted or OH-substituted C1-C12alkylene or is phenylene, R5 is the divalent radical, diminished by the -CO-O group, of a lactone having a total of 4 to 7 ring members and containing at least one chiral carbon atom and corresponding predominantly to an optically active enantiomeric form, R4 is a direct bond, C1-C4alkyl-CH or CF3-CH, and Y is phenyl, naphthyl, fluorenyl or anthryl, each unsubstituted or substituted by C1-C12alkyl, C1-C12alkoxy, halogen, -CN or -NO2. These compounds are suitable for the preparation of stationary phases for the chromatographic separation of chiral compounds.
Dappen Richard
Lohmann Dieter
Ag Ciba-Geigy
Dappen Richard
Fetherstonhaugh & Co.
Lohmann Dieter
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