Encapsulated high brightness electron beam source and system...

Details Encapsulated high brightness electron beam source and system... Encapsulated high brightness electron beam source and system...

H - Electricity

01

J

358/10

H01J 37/073 (2006.01)

Patent

CA 1325855

ABSTRACT OF THE DISCLOSURE An encapsulated high brightness source for use in or with an electron beam system such as an electron beam microscope. The source preferably includes a field emitter. The source includes source enclosure means which defines an ultra high vacuum enclosure for the field emitter. A lens which serves as part of the ultra high vacuum enclosure for the source defines a differential pressure aperture. Other lens elements draw electrons from the field emitter and form a focus on axis in the vicinity of the differential pressure aperture, which serves as an effective point source for the associated electron beam system. The source may be permanently built-in or modular; if modular, it may be assembled, tested, and stored in an ultra high vacuum operative condition for OEM assembly or as a replacement part.

597168

Affiliated with

Also associated with

Rating

Encapsulated high brightness electron beam source and system... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Encapsulated high brightness electron beam source and system..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Encapsulated high brightness electron beam source and system... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1249034