Endface assessment

G - Physics – 01 – B

Patent

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G01B 9/02 (2006.01) G01B 11/26 (2006.01)

Patent

CA 1232128

ABSTRACT ENDFACE ASSESSMENT Apparatus is disclosed for assessing features of the endface of a dielectric member by means of a reflected diffraction pattern. A plurality of light beams which intersect in a region containing the endface can be used to generate a diffraction pattern which subtends an angle of at least 180° at the endface. Such a diffraction pattern contains information about the endface and may be used, in particular, to locate the plane in which the end- face lies. Embodiments of the invention find particular application in the measurement of endface angles of optical fibres.

482677

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